Formation of Aluminum Yttrium Mixed Oxide Films by Electrodeposition.

Formation of Cupric Oxide Films on Quartz Substrates by Annealing the Copper Films

In the present work, cupric oxide (CuO) films were obtained through thermal annealing of the copper (Cu) films deposited on quartz substrates by DC magnetron sputtering method. The annealing was performed in air atmosphere for different times ranging from 60-240 min at temperature of 400 ºC. The influence of annealing times on structural and morphological properties of the films was investi...

Electrodeposition of Polypyrrole Films on Aluminum from Tartrate Aqueous Solution

A síntese eletroquímica de filmes de polipirrol em superfícies de alumínio, em meio aquoso contendo ácido tartárico e pirrol, foi realizada através da técnica galvanostática e por voltametria cíclica. Um mecanismo que considera o crescimento de uma camada porosa de óxido de alumínio em paralelo com a eletrodeposição do filme de polipirrol foi proposto. Foi observado que quanto mais homogênea a ...

Production of yttrium aluminum silicate microspheres by gelation of an aqueous solution containing yttrium and aluminum ions in silicone oil

Background: Radioactive yttrium glass microspheres are used for liver cancer treatment. These yttrium aluminum silicate microspheres are synthesized from yttrium, aluminum and silicone oxides by melting. There are two known processes used to transform irregular shaped glass particles into microspheres, these ‘spheroidization by flame’ and ‘spheroidization by gravitational fall...

Investigations of the Causes of Expansion for Yttrium Oxide Films

Brigham Young University's Department of Physical and Astronomy's Thin Film Research Group has been studying the apparent expansion of yttrium oxide and scandium oxide when exposed to 7.27 eV excimer lamp. These films have more than tripled their initial thickness because of the exposure. Such expansion is quite unexpected. The excimer lamp used is very similar to UV cleaning lamps used to clea...

formation of cupric oxide films on quartz substrates by annealing the copper films